An Optimization Strategy for 65 nm Node Photomasks

We introduced a quasi-gradient concept in simulated annealing(SA) algorithm to improve the optimization process for photomask generation.The proposed approach decreases the number of null searches in SA algorithm by firstly searching in the critical-zone indicated by the 'quasi-gradient',and is more efficient than the old method,with yet higher quality.Experimental results show that this algorithm is of good accuracy and fast speed.