Curvature Dependent Particles Sampling of Static Implicit Surfaces

In the process of implicit surfaces rendering,the parameters adjustment is not effective,and the accuracy is beyond our control.We introduce an approach to sample static implicit surfaces depended on curvature.A seed particle,which is chosen first,initializes other particles.All particles are updated with the local electrostatic repulsion forces and reprojection,and they achieve a preliminary uniform state.By the local mutual forces varying with the curvature of the particles,the implicit surfaces get the final representations.The method is demonstrated to be effective,and can be suitable for complicated surfaces.The inaccuracy can be controlled in some state,and mass parameters adjustment can be avoided.